Doping while deposition (growing the crystal)

  • Not yet sure how CVD is done, but there’s gases involved.
  • So we just make one of the gases our dopant.

Doping after growing

Diffusion

  • Exactly what it sounds like.
  • Exposing silicon to high temp gases containing our dopants, transfers some of the dopants into our substrate through diffusion.

Ion implantation

  • You literally blast the substrate with ions of your dopant.

The two above can be controlled by lithography+masking.

Spin Coater

  • Literally spin coating the substrate with a mixture of stuff with the dopant and then stripping + baking the substrate at a high temp.